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au.\*:("Asian joint Committee on Plasma Surface Engineering (AJC\/PSE)")

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Results 1 to 25 of 226

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Continuous synthesis of carbon nanoclusters using well-controlled thermal plasmasOHISHI, T; YOSHIHARA, Y; FUKUMASA, O et al.Surface & coatings technology. 2008, Vol 202, Num 22-23, pp 5329-5332, issn 0257-8972, 4 p.Conference Paper

Effect of nozzle shape on the performance of high velocity oxygen-fuel thermal spray systemBAIK, Jae-Sang; KIM, Youn-Jea.Surface & coatings technology. 2008, Vol 202, Num 22-23, pp 5457-5462, issn 0257-8972, 6 p.Conference Paper

Reactive sputtering deposition of V2O5-z on flexible PET/ITO substrates for electrochromic devicesLIN, Yung-Sen; TSAI, Chung-Wei.Surface & coatings technology. 2008, Vol 202, Num 22-23, pp 5641-5645, issn 0257-8972, 5 p.Conference Paper

Decomposition of PFCs by steam plasma at atmospheric pressureKIM, Dong-Yun; DONG WHA PARK.Surface & coatings technology. 2008, Vol 202, Num 22-23, pp 5280-5283, issn 0257-8972, 4 p.Conference Paper

Effects of gas bubbling on water-solubilization of carbon nanotube using microplasma generated in waterIMASAKA, Kiminobu; KATO, Yuki; SUEHIRO, Junya et al.Surface & coatings technology. 2008, Vol 202, Num 22-23, pp 5271-5274, issn 0257-8972, 4 p.Conference Paper

Functional multilayer coatings of tetravinylsilaneSTUDYNKA, J; CECHALOVA, B; CECH, V et al.Surface & coatings technology. 2008, Vol 202, Num 22-23, pp 5505-5507, issn 0257-8972, 3 p.Conference Paper

Production of fine hydroxyapatite films using the well-controlled thermal plasmaKOU, Masahiro; TODA, Takafumi; FUKUMASA, Osamu et al.Surface & coatings technology. 2008, Vol 202, Num 22-23, pp 5753-5756, issn 0257-8972, 4 p.Conference Paper

Large-area low-damage plasma sources driven by multiple low-inductance-antenna modules for next-generation flat-panel display processesSETSUHARA, Yuichi; TAKENAKA, Kosuke; EBE, Akinori et al.Surface & coatings technology. 2008, Vol 202, Num 22-23, pp 5225-5229, issn 0257-8972, 5 p.Conference Paper

Lattice effects in ferromagnetic La1-xBaxMnO3 thin filmsLIANG, Yuan-Chang.Surface & coatings technology. 2008, Vol 202, Num 22-23, pp 5436-5439, issn 0257-8972, 4 p.Conference Paper

TiO2 thin film coating on a capillary inner surface using atmospheric-pressure microplasmaYOSHIKI, Hiroyuki; MITSUI, Toshiaki.Surface & coatings technology. 2008, Vol 202, Num 22-23, pp 5266-5270, issn 0257-8972, 5 p.Conference Paper

Sixth Asian-European International Conference on Plasma Surface Engineering, AEPSE 2007SHIRATANI, Masaharu; CUI, Fu-Zhai; BRÄUER, Günter et al.Surface & coatings technology. 2008, Vol 202, Num 22-23, issn 0257-8972, 589 p.Conference Proceedings

Effect of admixture of metal vapor on cathode surface temperature of plasma torchTASHIRO, Shinichi; TANAKA, Manabu.Surface & coatings technology. 2008, Vol 202, Num 22-23, pp 5255-5258, issn 0257-8972, 4 p.Conference Paper

Optical spectroscopy to control a plasma reactor for surface treatmentsRICARD, A; GABORIAU, F; CANAL, C et al.Surface & coatings technology. 2008, Vol 202, Num 22-23, pp 5220-5224, issn 0257-8972, 5 p.Conference Paper

Surface functionalization of PTFE sheet through atmospheric pressure plasma liquid deposition approachZETTSU, Nobuyuki; ITOH, Hiroto; YAMAMURA, Kazuya et al.Surface & coatings technology. 2008, Vol 202, Num 22-23, pp 5284-5288, issn 0257-8972, 5 p.Conference Paper

Effects of radio frequency powers on the characteristics of a-C:N/p-Si photovoltaic solar cells prepared by plasma enhanced chemical vapor depositionCHU, Rong-Shian; SHIUE, Sham-Tsong.Surface & coatings technology. 2008, Vol 202, Num 22-23, pp 5364-5366, issn 0257-8972, 3 p.Conference Paper

The preparation of oxygenated fullerene film and its photoelectrical propertiesCHO, Wook; YANG, Sung-Chae.Surface & coatings technology. 2008, Vol 202, Num 22-23, pp 5333-5335, issn 0257-8972, 3 p.Conference Paper

The size effect of oxygen impurities on the hardness of Ti-Si-N coatingsDAYAN MA; SHENGLI MA; KEWEI XU et al.Surface & coatings technology. 2008, Vol 202, Num 22-23, pp 5512-5515, issn 0257-8972, 4 p.Conference Paper

Uniformity of 500-mm cylindrical plasma source sustained with multiple low-inductance antenna unitsSETSUHARA, Yuichi; TSUKIYAMA, Daisuke; TAKENAKA, Kosuke et al.Surface & coatings technology. 2008, Vol 202, Num 22-23, pp 5238-5241, issn 0257-8972, 4 p.Conference Paper

Wave analysis in microwave-excited plasma reactor using MSP antennaTSUJI, A; YASAKA, Y; TAKENO, H et al.Surface & coatings technology. 2008, Vol 202, Num 22-23, pp 5306-5309, issn 0257-8972, 4 p.Conference Paper

Comparison of carbon deposition on tungsten between molecular dynamics and dynamic Monte Carlo simulationINAI, Kensuke; KIKUHARA, Y; OHYA, Kaoru et al.Surface & coatings technology. 2008, Vol 202, Num 22-23, pp 5374-5378, issn 0257-8972, 5 p.Conference Paper

Discharge profiles of internal-antenna-driven inductively-coupled plasmasSETSUHARA, Yuichi; SERA, Takashi; TAKENAKA, Kosuke et al.Surface & coatings technology. 2008, Vol 202, Num 22-23, pp 5234-5237, issn 0257-8972, 4 p.Conference Paper

Microwave power absorption coefficient of an ECR xenon ion thrusterNISHIYAMA, Kazutaka; KUNINAKA, Hitoshi.Surface & coatings technology. 2008, Vol 202, Num 22-23, pp 5262-5265, issn 0257-8972, 4 p.Conference Paper

Plasma polymer coating in a triode glow dischargeKUSABIRAKI, M; TAMURA, A.Surface & coatings technology. 2008, Vol 202, Num 22-23, pp 5709-5712, issn 0257-8972, 4 p.Conference Paper

Size-regulated gold nanoparticles fabricated by a discharge in reverse micelle solutionsHIEDA, Junko; SAITO, Nagahiro; TAKAI, Osamu et al.Surface & coatings technology. 2008, Vol 202, Num 22-23, pp 5343-5346, issn 0257-8972, 4 p.Conference Paper

Temperature effect on charge density of silicon nitride films deposited in SiH4-NH3-N2 plasmaKIM, Byungwhan; SANG HEE KWON.Surface & coatings technology. 2008, Vol 202, Num 22-23, pp 5539-5542, issn 0257-8972, 4 p.Conference Paper

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